VLSI MEMS for Batch Nanofabrication

Funded by NSF

3aThe objective of this project is to explore and develop a new enabling technology for low-cost high through-put parallel scanning probe nanolithography. Thermally driven actuators (Chevron Mechanism) have been used to achieve movements in X and Y directions when patterning shapes onto silicon wafers. Each actuator, with nanoscale probe tips on its movable platform, has nano-precision horizontal displacement and positioning capabilities with a movement range of a few nanometers to a few tens of microns. A large number of such actuators can be batch fabricated on a silicon substrate covering an overall area of up to a whole wafer, enabling wafer-level batch fabrication at nanoscale. Further design modifications are being investigated to enable nano-precision movement sensing and achieve high-quality patterns using the fabricated probes.



  1. E. Mehdizadeh and S. Pourkamali, “Two Degrees-Of-Freedom Thermally Actuated Nano-Positioner with Integrated Nano-Tips For Scanning Probe Nanolithography,” Proceedings of Nanomechanical Sensing Workshop, 2013.